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A collection of videos consist of a variety of lectures and instructional tutorials that the IEEE EMC society has sponsored over the years are now available for free to EMC Society member and a small fee to others.



Date: Tuesday, January 10, 2017

5:30pm: Networking/light dinner
6:30pm: Presentation
7:45pm: Adjourn

Water and soft drinks are free. Food is available for a small fee.

Location: 7layers

Title

Emission Source Microscopy and related near field scanning methods

Speaker

David Pommerenke, Electromagnetic Compatibility Laboratory at Missouri University of S&T

Abstract

Near field scanning visualizes the fields close to a product, e.g., an IC or PCB. However, it misleads us often by letting us associate areas of strong near field with causes of far field radiation. For example, if a microstrip trace is scanned it will show strong near fields over the trace. However, these fields do not radiate! Only the beginning and end of the microstrip cause the radiation. Emissions source microscopy allows to only visualize the radiating fields, any none radiating fields will not be shown. This sounds great, but it comes at a price: The resolution of near field scanning is determined by the probe size, and the probe to source structure distance. Thus, it can achieve 0.5mm or better. Emissions source microscopy has the same limitations as optical microscopy: The resolution is about lambda/2. Good at 30GHz, not really useful on a PCB at 500MHz. The talk will introduce the emissions source microscopy, show how limitations can be partially overcome, show that the total radiated power can rather easily be determined and illustrate by example that a complete scan can be performed in 10min. The method allows numerical " what if " experiments, by masking radiating areas one can quantify how large the contribution of each area is. Examples will be shown and other scanning techniques, such as ESD susceptibility scanning will be discussed.

Biography

David Pommerenke

David Pommerenke ' s research interests are system level ESD, electronics, numerical simulations, EMC measurement methods and instrumentations. He received the Ph.D. from the Technical University Berlin, Germany in 1996. After working at Hewlett Packard for 5 years he joined the Electromagnetic Compatibility Laboratory at the Missouri University of S&T in 2001 where he is professor . He is IEEE fellow and associated editor for the IEEE Transactions on EMC and published > 200 papers on areas ranging from high voltage to numerical methods with the main emphasis on measurement methods and ESD.